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Sensitive measurement of magnetostriction effects in thin films by means of a two-beam free-sample deflection method
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Titel: |
Sensitive measurement of magnetostriction effects in thin films by means of a two-beam free-sample deflection method |
In: | Review of Scientific Instruments, 72, 2001, 5, S. 2496-2497 |
veröffentlicht: |
AIP Publishing
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Umfang: | 2496-2497 |
ISSN: |
0034-6748 1089-7623 |
DOI: | 10.1063/1.1362436 |
Zusammenfassung: | <jats:p>We describe a setup for the measurement of thin-film magnetostriction λ which utilizes a sensitive laser-optical measurement of the substrate bending in magnetic fields up to 530 kA/m. The sensitivity reaches, e.g., for a 10 nm thick film on a 100 μm thick Si substrate, λ=5×10−8, which corresponds to a total substrate deflection on the order of 0.1 nm. The performance is tested with Co thin films of different thicknesses and annealing states.</jats:p> |
Format: | E-Article |
Quelle: | AIP Publishing (CrossRef) |
Sprache: | Englisch |