APA Citation

Post, R., Niewelt, T., Schön, J., Schindler, F., & Schubert, M C.(2019). Imaging Interstitial Iron Concentrations in Gallium‐Doped Silicon Wafers. physica status solidi (a), 216(10), 1800655. doi:10.1002/pssa.201800655

MLA Citation

Post, Regina, et al. "Imaging Interstitial Iron Concentrations in Gallium‐Doped Silicon Wafers". Physica Status Solidi (a), 216.10 ( 2019 ): 1800655.

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